Influence of sputtering mechanisms on the preferred orientation of aluminum nitride thin films

被引：0
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作者：
Clement, M. [1 ]
Iborra, E. [1 ]
Sangrador, J. [1 ]
Sanz-Hervás, A. [1 ]
Vergara, L. [1 ]
Aguilar, M. [1 ]
机构：
[1] Depto. de Tecn. Electrónica, E.T.S.I. Telecomunicación, Ciudad Universitaria, 28040 Madrid, Spain
来源：
Journal of Applied Physics | 2003年 / 94卷 / 03期
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