Optimization of ULSI plasma process for TiN thin film

被引：0
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作者：
Kishida, T. [1 ]
Tokunaga, M. [1 ]
Kubota, H. [1 ]
Yokoshi, M. [1 ]
Hara, T. [1 ]
机构：
[1] Kumamoto Univ, Kumamoto, Japan
来源：
Physica B: Condensed Matter | 1997年 / 239卷 / 1-2期
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页码：50 / 52
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