Spatially-averaged model for plasma etch processes: Comparison of different approaches to electron kinetics

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作者：
Ahlrichs, P. [1 ]
Riedel, U. [1 ]
Warnatz, J. [1 ]
机构：
[1] Interdisziplinäres Zentrum für Wissenschaftliches Rechnen, Universität Heidelberg, Im Neuenheimer Feld 368, D-69120 Heidelberg, Germany
来源：
Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films | 1998年 / 16卷 / 03期
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页码：1560 / 1565
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