Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [Tri-(tert-butoxy)siloxy-tri-(tert-butoxy)]titanium, [tC4H9O]3Si-O-Ti[OtC4H9]3, which is a single source alkoxide precursor

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Ford Research Lab, Dearborn, United States ^{[1
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Adv Mater | / 1卷 / 13-15期

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[1] Atmospheric pressure chemical vapor deposition of SiO2-TiO2 antireflective films from [Tri-(tert-butoxy)siloxy-tri-(tert-butoxy)]titanium,[(C4H9O)-C-t]Si-3-O-Ti[(OC4H9)-C-t](3), which is a single source alkoxide precursor
Narula, CK
Varshney, A
Riaz, U
CHEMICAL VAPOR DEPOSITION, 1996, 2 (01) : 13 - &
[2] Chemical vapor deposition of Pb(ZrxTi1-x)O3 films by Pb(C2H5)4,Ti(i-OC3H7)4, Zr(t-OC4H9)4 and O2:: role of lead oxide formation from Pb(C2H5)4 and O2 on film properties
Cheng, WY
Hong, LS
THIN SOLID FILMS, 2002, 415 (1-2) : 94 - 100