Characterization on the electrical properties of copper nitride thin films and the effects of hydrogen implantation

被引:0
|
作者
Graduate School of Engineering, Kyushu University, Fukuoka 812-8581, Japan [1 ]
机构
来源
Nippon Kinzoku Gakkaishi | / 5卷 / 621-624期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Characterization on the electrical properties of copper nitride thin films and the effects of hydrogen implantation
    Ishikawa, T
    Masuda, M
    Hayashi, Y
    JOURNAL OF THE JAPAN INSTITUTE OF METALS, 1999, 63 (05) : 621 - 624
  • [2] Hydrogen implantation effects on the electrical and optical properties of metal nitride thin films
    Ishikawa, T
    Masuda, M
    Hayashi, Y
    MATERIALS TRANSACTIONS, 2002, 43 (05) : 1138 - 1141
  • [3] Hydrogen implantation effects on the electrical and optical properties of metal nitride thin films
    Ishikawa, T
    Masuda, M
    Hayashi, Y
    PRICM 4: FORTH PACIFIC RIM INTERNATIONAL CONFERENCE ON ADVANCED MATERIALS AND PROCESSING, VOLS I AND II, 2001, : 2837 - 2840
  • [4] Hydrogen implantation effects on the electrical and optical properties of InSe thin films
    Qasrawi, Atef Fayez
    Ilaiwi, Khaled Faysal
    Polimeni, Antonio
    TURKISH JOURNAL OF PHYSICS, 2012, 36 (03): : 385 - 391
  • [5] The effects of oxygen plasma implantation on bipolar resistive-switching properties of copper nitride thin films
    Du, Xiaoqin
    Zhou, Qianfei
    Yan, Zhong
    Zhou, Yong-Ning
    Wu, Xiaojing
    THIN SOLID FILMS, 2017, 625 : 100 - 105
  • [6] Hydrogen effect on the optical and electrical properties of metal oxide and nitride thin films
    Hayashi, Y
    INTERNATIONAL JOURNAL OF HYDROGEN ENERGY, 2006, 31 (02) : 307 - 308
  • [7] Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content
    Broitman, E
    Hellgren, N
    Neidhardt, J
    Brunell, I
    Hultman, L
    JOURNAL OF ELECTRONIC MATERIALS, 2002, 31 (09) : L11 - L15
  • [8] Electrical properties of carbon nitride thin films: Role of morphology and hydrogen content
    E. Broitman
    N. Hellgren
    J. Neidhardt
    I. Brunell
    L. Hultman
    Journal of Electronic Materials, 2002, 31 : L11 - L15
  • [9] Modification of electrical and optical properties of metal nitride thin films by hydrogen inclusion
    Hayashi, Y
    Ishikawa, T
    Shimokawa, D
    JOURNAL OF ALLOYS AND COMPOUNDS, 2002, 330 : 348 - 351
  • [10] Adhesion and Electrical Properties of Copper Nitride Films
    Xiao, Jian-rong
    Jiang, Ai-hua
    NEW AND ADVANCED MATERIALS, PTS 1 AND 2, 2011, 197-198 : 344 - 347