Precision mass flow metering for CVD applications

被引：0
|
作者：
Boer, H.J. [1 ]
机构：
[1] Res. Dept. Bronkhorst High-Tech B.V., Nijverheidsstraat 1A, 7261 AK Ruurlo, Netherlands
来源：
Journal De Physique. IV : JP | 1999年 / 9 pt 2卷 / 08期
关键词：
Chemical sensors - Chemical vapor deposition - Flow control - Flow of fluids - Gases - Liquids - Networks (circuits) - Valves (mechanical);
D O I：
暂无
中图分类号：
学科分类号：
摘要：
Mass flow instruments play an important role in every CVD application. This paper will describe the basic characteristics of thermal mass flow metering and controlling of gases and liquids. The essential theoretical background will be given as well as information provided by the leading manufacturer in Europe. Also some practical uses of the instruments in CVD applications will be highlighted. With high accuracy and very good reproducibility the instruments are very well suited for the key role of controlling the fluids (gases and liquids) in CVD applications.
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页码：8 / 869
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