CURRENT STATUS OF IONIZED-CLUSTER BEAM TECHNIQUE: A LOW ENERGY ION BEAM DEPOSITION.

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作者
Yamada, I. [1 ]
Takagi, T. [1 ]
机构
[1] Kyoto Univ, Kyoto, Jpn, Kyoto Univ, Kyoto, Jpn
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RADIATION EFFECTS;
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摘要
Ionized cluster beams (ICB) are widely used to deposit metals, semiconductors and insulating films. The paper describes the current status of this technique in source development and film deposition. Computer simulation proved the formation processes of large size clusters. ICB low energy ion bombarding effects and several examples of film deposition are described.
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页码:120 / 123
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