Gas discharged based radiation source for EUV-lithography

被引：0
|
作者：
Lebert, R. [1 ]
Bergmann, K. [1 ]
Schriever, G. [1 ]
Neff, W. [2 ]
机构：
[1] Lehrstuhl für Lasertechnik, RWTH Aachen, Steinbachstraße 15, D-52074 Aachen, Germany
[2] Fraunhofer-Inst. fur Lasertechnik, Steinbachstraße 15, D-52074 Aachen, Germany
来源：
Microelectronic Engineering | 1999年 / 46卷 / 01期
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页码：449 / 452
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