In situ reflection high-energy electron diffraction observation of epitaxial LaNiO3 thin films

被引：0
|
作者：
机构：
来源：
J Appl Phys | / 5卷 / 3000期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] In situ reflection high-energy electron diffraction observation of epitaxial LaNiO3 thin films
    Chen, P
    Xu, SY
    Zhou, WZ
    Ong, CK
    Cui, DF
    JOURNAL OF APPLIED PHYSICS, 1999, 85 (05) : 3000 - 3002
  • [2] Effects of oxygen pressure on the microstructure of LaNiO3 conductive thin film monitored by in situ reflection high energy diffraction
    Zhu, Jun
    Zheng, Liang
    Wei, Xian Hua
    Zhang, Ying
    Li, Yan Rong
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2006, 24 (06): : 1985 - 1991
  • [3] Investigation of epitaxial LaNiO3-x thin films by high-energy XPS
    Mickevicius, S.
    Grebinskij, S.
    Bondarenka, V.
    Vengalis, B.
    Sliuziene, K.
    Orlowski, B. A.
    Osinniy, V.
    Drube, W.
    JOURNAL OF ALLOYS AND COMPOUNDS, 2006, 423 (1-2) : 107 - 111
  • [4] Investigation of epitaxial LaNiO3-x thin films by high-energy XPS
    Mickevičius, S.
    Grebinskij, S.
    Bondarenka, V.
    Vengalis, B.
    Šliužiene, K.
    Orlowski, B.A.
    Osinniy, V.
    Drube, W.
    Journal of Alloys and Compounds, 2006, 423 (1-2 SPEC. ISS.): : 107 - 111
  • [5] The role of epitaxial strain on photoconductive performance in LaNiO3 epitaxial thin films
    Li, Jie
    Liu, Haifeng
    Wu, Hongwei
    Yang, Jiacheng
    Deng, Ting
    Liu, Sili
    Xie, Ruishi
    Guo, Baogang
    Zhang, Xingquan
    Zheng, Kui
    Huo, Jichuan
    CERAMICS INTERNATIONAL, 2023, 49 (12) : 20723 - 20728
  • [6] Epitaxial growth and surface metallic nature of LaNiO3 thin films
    Tsubouchi, K.
    Ohkubo, I.
    Kumigashira, H.
    Matsumoto, Y.
    Ohnishi, T.
    Lippmaa, M.
    Koinuma, H.
    Oshima, M.
    APPLIED PHYSICS LETTERS, 2008, 92 (26)
  • [7] Reflection high-energy electron loss spectroscopy (RHEELS):: a new approach in the investigation of epitaxial thin film growth by reflection high-energy electron diffraction (RHEED)
    Masek, K
    Moroz, V
    Matolín, V
    VACUUM, 2003, 71 (1-2) : 59 - 64
  • [8] In situ composition monitoring using reflection high-energy electron diffraction for SrTiO3 thin films grown by reactive coevaporation
    Peng, LSJ
    Moeckly, BH
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2004, 22 (06): : 2437 - 2439
  • [9] In-situ monitoring of epitaxial growth by different reflection high-energy electron diffraction under high pressure
    Northeast Univ, Shenyang, China
    Zhenkong Kexue yu Jishu Xuebao/Vacuum Science and Technology, 1998, 18 (06): : 470 - 474
  • [10] CHARACTERIZATION OF EPITAXIAL THIN-FILMS BY REFLECTION HIGH-ENERGY ELECTRON-DIFFRACTION, TRANSMISSION ELECTRON-MICROSCOPY AND AUGER-ELECTRON SPECTROSCOPY
    VOOK, RW
    THIN SOLID FILMS, 1982, 90 (01) : 99 - 99
12345