Gamma-ray induced Doppler shift attenuation after (n, γ) reactions in Si and Ti

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作者
Kahn, T. [1 ]
von Egidy, T. [1 ]
Hartmann, F.J. [1 ]
Ott, J. [1 ]
Jentschel, M. [1 ]
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[1] Technische Universitaet Muenchen, Garching, Germany
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页码:100 / 107
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