Atomistic simulation of mobile defect clusters in metals

被引：0
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作者：
Osetsky, Yu N. [1 ]
Bacon, D.J. [1 ]
Serra, A. [2 ]
机构：
[1] Materials Science and Engineering, Department of Engineering, University of Liverpool, Liverpool L69 3BX, United Kingdom
[2] Dept. Mat. Aplicada HI, Universität Politecnica de Catalunya, Jordi Girona 1-3, E-08034 Barcelona, Spain
来源：
Materials Research Society Symposium - Proceedings | 1999年 / 540卷
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页码：649 / 654
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