共 50 条
- [1] Novel photo resist stripping for single wafer process ULTRA CLEAN PROCESSING OF SILICON SURFACES VII, 2005, 103-104 : 297 - 300
- [2] Photo resist stripping using novel sulfuric/ozone process 2001 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS, 2001, : 199 - 202
- [3] Efficient ozone, sulfate and ammonium free resist stripping process PHOTOMASK AND NEXT-GENERATION LITHOGRAPHY MASK TECHNOLOGY XXI, 2014, 9256
- [4] Novel photo resist stripping for single wafer environmentally friendly process ISSM 2005: IEEE International Symposium on Semiconductor Manufacturing, Conference Proceedings, 2005, : 453 - 455
- [6] Alternative methods for resist stripping CLEANING TECHNOLOGY IN SEMICONDUCTOR DEVICE MANUFACTURING V, 1998, 35 : 496 - 504
- [8] A high-temperature batch-spray process for implanted resist stripping Solid State Technol, 2006, 6 (83-85):
- [9] Development of photo-resist stripping process using ozone and water vapor 2001 IEEE INTERNATIONAL SYMPOSIUM ON SEMICONDUCTOR MANUFACTURING, CONFERENCE PROCEEDINGS, 2001, : 233 - 236
- [10] Resist stripping process development for porous low-k dielectric materials ASCMC 2003: IEEE/SEMI (R) ADVANCED SEMICONDUCTOR MANUFACTURING CONFERENCE AND WORKSHOP, PROCEEDINGS, 2003, : 142 - 147