Growth kinetics of nitride layers during postdischarge nitriding

被引：0
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作者：
Campos, I. [1 ]
Oseguera, J. [1 ]
Figueroa, U. [1 ]
Melendez, E. [1 ]
机构：
[1] ITESM-CEM-DGI, Atizapan, Mexico
来源：
Surface and Coatings Technology | 1998年 / 102卷 / 1-2期
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页码：127 / 131
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