Chemical Vapor Deposition of CuOx Films by Cul and O2: Role of Cluster Formation on Film Morphology

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[1] Hong, Lu-Sheng
[2] Komiyama, Hiroshi
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| 1600年 / Blackwell Publishing Inc., Postfach 10 11 61, 69451 Weinheim, Boschstrabe 12, 69469 Weinheim, Deutschland, 69469, Germany卷 / 74期
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