Origin and effect of impurity incorporation in plasma-enhanced ZrO2 deposition

被引:0
|
作者
机构
[1] Cho, Byeong-Ok
[2] Lao, Sandy X.
[3] Chang, Jane P.
来源
Cho, B.-O. (jpchang@ucla.edu) | 1600年 / American Institute of Physics Inc.卷 / 93期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Origin and effect of impurity incorporation in plasma-enhanced ZrO2 deposition
    Cho, BO
    Lao, SX
    Chang, JR
    JOURNAL OF APPLIED PHYSICS, 2003, 93 (11) : 9345 - 9351
  • [2] Metalorganic precursor decomposition and oxidation mechanisms in plasma-enhanced ZrO2 deposition
    Cho, BO
    Wang, JJ
    Chang, JP
    JOURNAL OF APPLIED PHYSICS, 2002, 92 (08) : 4238 - 4244
  • [3] ZrO2 gate dielectric deposited by plasma-enhanced atomic layer deposition method
    Koo, Jaehyoung
    Kim, Yangdo
    Jeon, Hyeongtag
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (5 A): : 3043 - 3046
  • [4] ZrO2 gate dielectric deposited by plasma-enhanced atomic layer deposition method
    Koo, J
    Kim, Y
    Jeon, H
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (5A): : 3043 - 3046
  • [5] Computer Modeling of Plasma-Enhanced Atomic Layer Deposition of HfO2 and ZrO2
    Zyuzin S.S.
    Ganykina E.A.
    Rezvanov A.A.
    Zasseev Y.G.
    Gvozdev V.A.
    Gornev E.S.
    Russian Microelectronics, 2023, 52 (Suppl 1) : S184 - S193
  • [6] The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition
    Chen, Zheng
    Wang, Haoran
    Xiong, Pengpeng
    Chen, Ping
    Li, Huiying
    Liu, Yunfei
    Duan, Yu
    JOURNAL OF PHYSICAL CHEMISTRY C, 2017, 121 (08): : 4714 - 4719
  • [7] Characteristics of nanocomposite ZrO2/Al2O3 films deposited by plasma-enhanced atomic layer deposition
    Yun, Sun Jin
    Lim, Jung Wook
    Kim, Hyun-Tak
    JOURNAL OF NANOSCIENCE AND NANOTECHNOLOGY, 2007, 7 (11) : 4180 - 4184
  • [8] Plasma enhanced atomic layer deposition of ZrO2 gate dielectric
    Koo, JY
    Han, JW
    Choi, SW
    Park, CG
    Kim, YD
    Jeon, HT
    SILICON MATERIALS-PROCESSING, CHARACTERIZATION AND RELIABILITY, 2002, 716 : 67 - 72
  • [9] Plasma enhanced chemical vapour deposition of ZrO2 and YSZ coatings
    Espinoza-Perez, L. J.
    Lopez-Honorato, Eddie
    MATERIALS SCIENCE AND TECHNOLOGY, 2023, 39 (15) : 1977 - 1987
  • [10] Plasma Enhanced Atomic Layer Deposition of ZrO2: A Thermodynamic Approach
    Blanquet, E.
    Monnier, D.
    Nuta, I.
    Volpi, F.
    Doisneau, B.
    Coindeau, S.
    Roy, J.
    Detlefs, B.
    Mi, Y.
    ZegenHagen, J.
    Martinet, C.
    Wyon, C.
    Gros-Jean, M.
    SILICON NITRIDE, SILICON DIOXIDE, AND EMERGING DIELECTRICS 11, 2011, 35 (04): : 497 - 513