共 50 条
- [3] ZrO2 gate dielectric deposited by plasma-enhanced atomic layer deposition method Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 2002, 41 (5 A): : 3043 - 3046
- [4] ZrO2 gate dielectric deposited by plasma-enhanced atomic layer deposition method JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2002, 41 (5A): : 3043 - 3046
- [6] The Cut-Off Phenomenon Effect on ZrO2 Growth Using Remote Plasma-Enhanced Atomic Layer Deposition JOURNAL OF PHYSICAL CHEMISTRY C, 2017, 121 (08): : 4714 - 4719
- [8] Plasma enhanced atomic layer deposition of ZrO2 gate dielectric SILICON MATERIALS-PROCESSING, CHARACTERIZATION AND RELIABILITY, 2002, 716 : 67 - 72
- [10] Plasma Enhanced Atomic Layer Deposition of ZrO2: A Thermodynamic Approach SILICON NITRIDE, SILICON DIOXIDE, AND EMERGING DIELECTRICS 11, 2011, 35 (04): : 497 - 513