Plasma deposition of silicon nitride films in a radial-flow reactor

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作者：

机构：

[1] Yoo, Chue-san

[2] Dixon, Anthony G.

来源：

Yoo, Chue-san | 1600年 / 35期

关键词：

Navier Stokes Equations - Nonisothermal Mathematical Models - Plasma Deposition - Plasma Enhanced Chemical Vapor Deposition - Radial Flow Reactors - Silicon Nitride Films;

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[1] PLASMA DEPOSITION OF SILICON-NITRIDE FILMS IN A RADIAL-FLOW REACTOR
YOO, CS
DIXON, AG
AICHE JOURNAL, 1989, 35 (06) : 995 - 1002
[2] Microscale radial-flow compressor impeller made of silicon nitride: Manufacturing and performance
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Johnston, JP
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Tsuru, H
Printz, FB
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[3] SILICON-NITRIDE DEPOSITION IN A VERTICAL FLOW REACTOR
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JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1984, 131 (08) : C319 - C319
[4] PLASMA DEPOSITION OF SILICON DIOXIDE AND SILICON-NITRIDE FILMS
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[5] DIFFUSIONAL EFFECTS IN A RADIAL-FLOW REACTOR WITH CATALYSIS AT WALL
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[7] Deposition of silicon nitride films in a remote plasma installation
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[8] Deposition of silicon nitride films in a remote plasma installation
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[9] ON THE DYNAMICS OF AN ISOTHERMAL RADIAL-FLOW PLASMA ETCHER
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[10] A high-activity nitrogen plasma flow source for deposition of silicon nitride films
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