共 50 条
- [2] FORMATION OF EXCELLENT SHALLOW N+P JUNCTIONS BY AS+ IMPLANTATION INTO THIN COSI FILMS ON SI SUBSTRATE NUCLEAR INSTRUMENTS & METHODS IN PHYSICS RESEARCH SECTION B-BEAM INTERACTIONS WITH MATERIALS AND ATOMS, 1993, 74 (1-2): : 147 - 150
- [4] Ultra-shallow N+P and P+N junction formation using low energy high dose As+ and BF2+ implantation and rapid thermal anneal SEMICONDUCTOR DEVICES, 1996, 2733 : 487 - 489