Microwave-induced unmagnetized plasma source for plasma processing

被引：0

作者：

Okamoto, Y. ^{[1
]}

机构：

[1] Toyo Univ, Saitama, Japan

来源：

Plasma Sources Science and Technology | 1996年 / 5卷 / 04期

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D O I：

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摘要：

引用

页码：648 / 652

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