Deposition of SiOx films from O2/HMDSO plasmas

被引：0
|
作者：
Hegemann, D. [1 ]
Vohrer, U. [1 ]
Oehr, C. [1 ]
Riedel, R. [1 ]
机构：
[1] Fraunhofer-Inst fuer Grenzflaechen-, und Bioverfahrenstechnik, Stuttgart, Germany
来源：
Surface and Coatings Technology | 1999年 / 116卷
关键词：
Parts of this work were supported by the German Wirtschaftsministerium Baden Württemberg (reference no. 4-4332.62-IGB/1) as well as several industrial partners. We thank G. Berg; Material Prüfungsanstalt; Institut für Werkstoffkunde; Darmstadt; for the hardness measurement;
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学科分类号：
摘要：
15
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页码：1033 / 1036
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