METHODS TO FABRICATE IMAGE SIZE STANDARD AND PITCH STANDARD.

被引：0
|
作者：
Jarry, A.
机构：
来源：
IBM technical disclosure bulletin | 1983年 / 25卷 / 09期
关键词：
SEMICONDUCTOR DEVICE MANUFACTURE - Imaging Techniques;
D O I：
暂无
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学科分类号：
摘要：
Fabrication of an image size standard may find interesting applications in various domains, such as for the calibration of measurement equipment. It may generate image size standards on masks (or substrates) which are widely used in the semiconductor industry. Today's accurate image size standards are limited to a size of 1 to 10 mu m. The proposed method permits the fabrication of image size standards of a range of tens to hundreds of microns, close to true size.
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页码：4883 / 4887
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