Response speed of nickel hydroxide thin films prepared by pulsed electrodeposition method

The nickel hydroxide electrochromic thin films were prepared by the pulsed electrodeposition method. The influence of the deposition parameters on the response speed during the coloring and bleaching processes was studied. It is found that the response speed is higher for the films prepared using deposition pulse with large on/off ratio and suitable reverse etching voltage. This is due to the change of the structure, the grain size is smaller and the volume fraction of the amorphous phase in the films is higher, thus improving the movement of the coloring ions in the material. It is also found that the films prepared by pulsed electrodeposition method is more stable than that prepared by the direct current deposition method.