Gas-phase nucleation in the tetraethylorthosilicate (TEOS)/O3 APCVD process

被引：0
|
作者：
Hiroshima Univ, Higashi-Hiroshima, Japan [1 ]
机构：
来源：
AIChE Journal | 1997年 / 43卷 / 11 A期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：2688 / 2697
相关论文
共 50 条
  • [1] Gas-phase nucleation in the tetraethylorthosilic (TEOS)/O-3 APCVD process
    Okuyama, K
    Fujimoto, T
    Hayashi, T
    Adachi, M
    AICHE JOURNAL, 1997, 43 (11) : 2688 - 2697
  • [2] Gas-phase nucleation in an atmospheric pressure chemical vapor deposition process for SiO2 films using tetraethylorthosilicate (TEOS)
    Adachi, Motoaki
    Okuyama, Kikuo
    Tohge, Noboru
    Shimada, Manabu
    Satoh, Jun-ichi
    Muroyama, Masakazu
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1992, 31 (10 A): : 1439 - 1442
  • [3] Decomposition of gas-phase chloroethenes by UV/O3 process
    Shen, YS
    Ku, Y
    WATER RESEARCH, 1998, 32 (09) : 2669 - 2679
  • [4] GAS-PHASE NUCLEATION IN AN ATMOSPHERIC-PRESSURE CHEMICAL VAPOR-DEPOSITION PROCESS FOR SIO2-FILMS USING TETRAETHYLORTHOSILICATE (TEOS)
    ADACHI, M
    OKUYAMA, K
    TOHGE, N
    SHIMADA, M
    SATOH, J
    MUROYAMA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 2-LETTERS & EXPRESS LETTERS, 1992, 31 (10A): : L1439 - L1442
  • [5] Optimization of SiO2 film conformality in TEOS/O3 APCVD
    Yuan, Zheng
    Mokhtari, Simin
    Ferdinand, Allen
    Eakin, John
    Bartholomew, Larry
    Thin Solid Films, 1996, 290-291 : 422 - 426
  • [6] APPLICATIONS OF APCVD TEOS/O3 THIN-FILMS IN ULSI IC FABRICATION
    FRY, HW
    WEST, JP
    POON, S
    BOECK, BA
    YU, CC
    SOLID STATE TECHNOLOGY, 1994, 37 (03) : 31 - &
  • [7] Products of the gas-phase reaction of O3 with cyclohexene
    Aschmann, SM
    Tuazon, EC
    Arey, J
    Atkinson, R
    JOURNAL OF PHYSICAL CHEMISTRY A, 2003, 107 (13): : 2247 - 2255
  • [8] PRODUCTS OF THE GAS-PHASE REACTIONS OF O3 WITH ALKENES
    ATKINSON, R
    TUAZON, EC
    ASCHMANN, SM
    ABSTRACTS OF PAPERS OF THE AMERICAN CHEMICAL SOCIETY, 1995, 209 : 37 - ENVR
  • [9] Treatment of gas-phase volatile organic compounds (VOCs) by the UV/O3 process
    Shen, YS
    Ku, Y
    CHEMOSPHERE, 1999, 38 (08) : 1855 - 1866
  • [10] Formation of SiOF Films by APCVD Using TEOS-O3-HF Gas Mixture
    Pacio, M.
    Juarez, H.
    Diaz, T.
    Rosendo, E.
    Garcia, G.
    Escalante, G.
    Ramirez, G.
    JOURNAL OF NANO RESEARCH, 2010, 9 : 39 - 43
12345