Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering

被引：0
|
作者：
Kim, Joo Han
Chung, Ki Woong
机构：
来源：
Journal of Applied Physics | 1998年 / 83卷 / 11 pt 1期
关键词：
D O I：
暂无
中图分类号：
学科分类号：
摘要：
引用
收藏
相关论文
共 50 条
  • [1] Microstructure and properties of silicon nitride thin films deposited by reactive bias magnetron sputtering
    Kim, JH
    Chung, KW
    JOURNAL OF APPLIED PHYSICS, 1998, 83 (11) : 5831 - 5839
  • [2] Influence of Substrate Temperature on Microstructure of Zirconium Silicon Nitride Thin Films Deposited by Reactive Magnetron Sputtering
    Oliveira, F. S.
    Dias, I. L.
    Araujo, P. L. L.
    Ramirez, D. A.
    Neto, P. C. Silva
    Hubler, R.
    Mendes, F. M. T.
    Damasceno, I. Z.
    Tentardini, E. K.
    MATERIALS RESEARCH-IBERO-AMERICAN JOURNAL OF MATERIALS, 2023, 26
  • [3] Silicon Nitride Thin Films Deposited by DC Pulse Reactive Magnetron Sputtering
    Zhang, Xiao-Feng
    Wen, Pei-Gang
    Yan, Yue
    SEVENTH INTERNATIONAL CONFERENCE ON THIN FILM PHYSICS AND APPLICATIONS, 2011, 7995
  • [4] Microstructure and optical properties of SiCN thin films deposited by reactive magnetron sputtering
    Peng, Yinqiao
    Zhou, Jicheng
    Gong, Jiehong
    Yu, Qinrong
    MATERIALS LETTERS, 2014, 131 : 148 - 150
  • [5] Aluminium nitride thin films deposited by DC reactive magnetron sputtering
    Dimitrova, V
    Manova, D
    Paskova, T
    Uzunov, T
    Ivanov, N
    Dechev, D
    VACUUM, 1998, 51 (02) : 161 - 164
  • [6] TITANIUM NITRIDE THIN-FILMS DEPOSITED BY REACTIVE MAGNETRON SPUTTERING
    GEORGIEV, GP
    POPOV, DN
    PLASMA SURFACE ENGINEERING, VOLS 1 AND 2, 1989, : 587 - 594
  • [7] Microstructure and hydrogen impermeability of titanium nitride thin films deposited by direct current reactive magnetron sputtering
    Zhou, Tong
    Liu, Dawei
    Zhang, Ying
    Ouyang, Taoyuan
    Suo, Jinping
    JOURNAL OF ALLOYS AND COMPOUNDS, 2016, 688 : 44 - 50
  • [8] Effect of substrate temperature on the properties of copper nitride thin films deposited by reactive magnetron sputtering
    Cho, Shinho
    CURRENT APPLIED PHYSICS, 2012, 12 : S44 - S47
  • [9] Effect of ion assistance on silicon nitride films deposited by reactive magnetron sputtering
    You, Daoming
    Liu, Weihua
    Jiang, Yu
    Cao, Yingchun
    Guo, Wentao
    Tan, Manqing
    MATERIALS SCIENCE IN SEMICONDUCTOR PROCESSING, 2023, 157
  • [10] Influence of the magnetron on the growth of aluminum nitride thin films deposited by reactive sputtering
    Iriarte, G. F.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2010, 28 (02): : 193 - 198
12345