PERSONNEL NEUTRON DOSIMETRY USING HOT, LOW-FREQUENCY ELECTROCHEMICAL ETCHING.

被引：0

作者：

Hankins, Dale E. ^{[1
]}

Homann, Steven G. ^{[1
]}

Davis, Joane M. ^{[1
]}

机构：

[1] Lawrence Livermore Natl Lab,, Livermore, CA, USA, Lawrence Livermore Natl Lab, Livermore, CA, USA

来源：

Nuclear tracks | 1985年 / 12卷 / 1-6期

关键词：

ETCHING - NEUTRONS - Measurements - PARTICLE DETECTORS;

D O I：

暂无

中图分类号：

学科分类号：

摘要：

We have developed an electrochemical-etch procedure for the processing of large numbers of CR-39 dosimeters. Specially designed Homann-Type chambers can etch up to 24 CR-39 chips, or foils, at one time. In our two-step procedure, the second step, called blow-up, increases the tracks' size and makes them relatively uniform. The energy response is fairly flat from approximately 150 kev to 4. 5 Mev, but drops by about a factor of three in the 13-16 Mev range. The sensitivity of the dosimetry system is 6 tracks/mrem with a background of 8 mrem, giving a lower limit of sensitivity of approximately 10 mrem for the dosimeter (when three foils are used). Because greater numbers of CR-39 foils can be accommodated at any one time, our procedure is quite efficient for operations with large numbers of dosimeters to be processed.

引用

页码：641 / 644

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