Reactive Ion Etching of a WSi2 plus Polycrystalline Si Polysilicide Grid in an SF6 Plasma.

被引：0
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作者：
Henry, D. [1 ]
Ranta, M. [1 ]
Pons, M. [1 ]
Kirtsch, J. [1 ]
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[1] CNET, Meylan, Fr, CNET, Meylan, Fr
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| 1600年 / 38期
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摘要：
INTEGRATED CIRCUIT MANUFACTURE
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