Fabrication and characterization of InP-based quantum cascade distributed feedback lasers with inductively coupled plasma etched lateral gratings

被引:0
|
作者
Kennedy, Kenneth [1 ]
Revin, Dmitry G. [2 ]
Krysa, Andrey B. [1 ]
Groom, Kristian M. [1 ]
Wilson, Luke R. [2 ]
Cockburn, John W. [2 ]
Hogg, Richard A. [1 ]
机构
[1] EPSRC National Centre for III-V Technologies, University of Sheffield, Sir Frederick Mappin Building, Mappin Street, Sheffield S1l3 JD, United Kingdom
[2] Department of Physics and Astronomy, University of Sheffield, Sheffield S3 7RH, United Kingdom
关键词
We present details of the fabrication and operating characteristics of quantum cascade distributed feedback lasers with lateral gratings. These devices emit light with a wavelength of ∼10 μm and operate with pulsed drive current above room temperature. InP-based material offers significant advantages over the GaAs system for mid-infrared quantum cascade lasers. High performance; single-mode lasers are achieved using InP-based material grown by metal organic vapor phase epitaxy and utilising double-sided lateral gratings. The deeply etched gratings were made possible by the development of a high aspect ratio; multi-stage; inductively coupled plasma (ICP) etch process; using Cl 2/Ar and SiCl4/Ar gas mixtures. Threshold current density was measured to be ∼5.5 kA/cm2 at a temperature of 293 K. Side mode suppression ratios >20 dB and a tuning coefficient of -0.067 cm -1 K-1 were observed. © 2007 The Japan Society of Applied Physics;
D O I
暂无
中图分类号
学科分类号
摘要
Journal article (JA)
引用
收藏
页码:2424 / 2428
相关论文
共 50 条
  • [1] Fabrication and characterization of InP-based quantum cascade distributed feedback lasers with inductively coupled plasma etched lateral gratings
    Kennedy, Kenneth
    Revin, Dmitry G.
    Krysa, Andrey B.
    Groom, Kristian M.
    Wilson, Luke R.
    Cockburn, John W.
    Hogg, Richard A.
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS BRIEF COMMUNICATIONS & REVIEW PAPERS, 2007, 46 (4B): : 2424 - 2428
  • [2] High performance InP-based quantum cascade distributed feedback lasers with deeply etched lateral gratings
    Kennedy, K.
    Krysa, A. B.
    Roberts, J. S.
    Groom, K. M.
    Hogg, R. A.
    Revin, D. G.
    Wilson, L. R.
    Cockburn, J. W.
    APPLIED PHYSICS LETTERS, 2006, 89 (20)
  • [3] Distributed feedback terahertz quantum cascade lasers with complex-coupled metallic gratings
    Chen, J. Y.
    Liu, J. Q.
    Liu, F. Q.
    Li, L.
    Wang, L. J.
    Wang, Z. G.
    ELECTRONICS LETTERS, 2010, 46 (19) : 1340 - 1341
  • [4] Index-coupled multi-wavelength distributed feedback quantum cascade lasers based on sampled gratings
    Song Tan
    Jinchuan Zhang
    Lijun Wang
    Fengqi Liu
    Ning Zhuo
    Fangliang Yan
    Junqi Liu
    Zhanguo Wang
    Optical and Quantum Electronics, 2014, 46 : 1539 - 1546
  • [5] Index-coupled multi-wavelength distributed feedback quantum cascade lasers based on sampled gratings
    Tan, Song
    Zhang, Jinchuan
    Wang, Lijun
    Liu, Fengqi
    Zhuo, Ning
    Yan, Fangliang
    Liu, Junqi
    Wang, Zhanguo
    OPTICAL AND QUANTUM ELECTRONICS, 2014, 46 (12) : 1539 - 1546
  • [6] Inductively coupled plasma etching in fabrication of 2D InP-based photonic crystals
    Wang, Hailing
    Xing, Mingxin
    Ren, Gang
    Zheng, Wanhua
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2009, 27 (03): : 1093 - 1096
  • [7] Smooth sidewall in InP-based photonic crystal membrane etched by N2-based inductively coupled plasma
    Lee, K. H.
    Guilet, S.
    Patriarche, G.
    Sagnes, I.
    Talneau, A.
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY B, 2008, 26 (04): : 1326 - 1333
  • [8] High performance short wavelength InP-based quantum cascade lasers
    Revin, Dmitry G.
    Commin, J. Paul
    Zhang, Shiyong Y.
    Krysa, Andrey B.
    Kennedy, Kenneth
    Cockburn, John W.
    NOVEL IN-PLANE SEMICONDUCTOR LASERS IX, 2010, 7616
  • [9] InP-based quantum cascade lasers monolithically integrated onto silicon
    Go, Rowel
    Krysiak, H.
    Fetters, M.
    Figueiredo, Pedro
    Suttinger, Matthew
    Fang, X. M.
    Eisenbach, A.
    Fastenau, J. M.
    Lubyshev, D.
    Liu, A. W. K.
    Huy, N. G.
    Morgan, A. O.
    Edwards, S. A.
    Furlong, M. J.
    Lyakh, Arkadiy
    OPTICS EXPRESS, 2018, 26 (17): : 22389 - 22393
  • [10] Surface Grating Fabrication by Inductively Coupled Plasma Dry Etching for InP-Based Photonic Integrated Circuits
    Zhang, Juan
    Sun, Changzheng
    Xiong, Bing
    Zheng, Yanzhen
    Wang, Jian
    Hao, Zhibiao
    Wang, Lai
    Han, Yanjun
    Li, Hongtao
    Luo, Yi
    Xiao, Yi
    Yu, Chuanqing
    Tanemura, Takuo
    Nakano, Yoshiaki
    PHYSICA STATUS SOLIDI A-APPLICATIONS AND MATERIALS SCIENCE, 2018, 215 (18):