Combinatorial investigation of ZrO2-based dielectric materials for dynamic random-access memory capacitors

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School of Science and Technology, Meiji University, Kawasaki 214-8571, Japan [1 ]
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Jpn. J. Appl. Phys. | / 6 PART 2卷
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Compilation and indexing terms; Copyright 2025 Elsevier Inc;
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摘要
Tantalum compounds - High-k dielectric - Silicon oxides - Dynamic random access storage - Zirconia - Pulsed laser deposition - Low-k dielectric - Metal insulator boundaries - MIM devices - Titanium compounds
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