In-plane thermal conductivity measurements of Si μ-cantilevers using the suspended thermo-reflectance (STR) technique

被引:0
|
作者
Sarkar, Dipta [1 ]
Singh, Gurpreet [1 ]
Yilbas, Bekir S. [2 ,3 ]
Mansoor, Saad B. [2 ,3 ]
Al-Qahtani, Hussain [2 ]
Leseman, Zayd C. [2 ,4 ]
机构
[1] Kansas State Univ, Alan Levin Dept Mech & Nucl Engn, Manhattan, KS 66502 USA
[2] King Fahd Univ Petr & Minerals, Dept Mech Engn, Dhahran 31261, Saudi Arabia
[3] King Fahd Univ Petr & Minerals, IRC Sustainable Energy Syst IRC SES, Dhahran, Saudi Arabia
[4] King Fahd Univ Petr & Minerals, Interdisciplinary Res Ctr Adv Mat, Dhahran 31261, Saudi Arabia
来源
REVIEW OF SCIENTIFIC INSTRUMENTS | 2024年 / 95卷 / 10期
关键词
SILICON; HEAT; THERMOREFLECTANCE; TRANSPORT;
D O I
10.1063/5.0203391
中图分类号
TH7 [仪器、仪表];
学科分类号
0804 ; 080401 ; 081102 ;
摘要
The Suspended Thermoreflectance (STR) technique is described in this paper. This optoelectronic measurement tool performs thermal characterization of freestanding micro-/nanoscale materials. STR performs thermal mapping at the submicron level and produces unconstrained thermal conductivity unlike other optical measurement techniques where independent conductivity measurement is not possible due to their reliance on heat capacity. STR works by changing the temperature of a material and collecting the associated change in light reflection from multiple points on the sample surface. Reflection is a function of the material being tested, the wavelength of the probe light, geometry, and the composition of the specimen for transparent and quasi-transparent materials. In this article, Si mu-cantilevers are studied. In addition, a thermal analytical model is developed and incorporated with optical equations to characterize the conductivity of the Si mu-cantilevers. The analytical model is compared with a finite element model to check its applicability in the STR experiment and data analysis. To validate the technique, the thermal conductivity of 2 and 3 mu m thick Si mu-cantilevers was determined using STR at a temperature range of 20-350 K and compared to simulations using the equation of phonon radiative transfer and literature values.
引用
收藏
页数:17
相关论文
共 50 条
  • [1] An optimized thermo-reflectance technique for thermal conductivity measurements of thin-film electronic materials
    Burzo, M. G.
    Komarov, P. L.
    Raad, P. E.
    THERMAL CONDUCTIVITY 28: THERMAL EXPANSION 16, 2006, 28 : 413 - +
  • [2] A study of the effect of surface metalization on thermal conductivity measurements by the transient thermo-reflectance method
    Burzo, MG
    Komarov, PL
    Raad, PE
    JOURNAL OF HEAT TRANSFER-TRANSACTIONS OF THE ASME, 2002, 124 (06): : 1009 - 1018
  • [3] Thermal Conductivity and Interfacial Thermal Resistance: Measurements of Thermally Oxidized SiO2 Films on a Silicon Wafer Using a Thermo-Reflectance Technique
    Ryozo Kato
    Ichiro Hatta
    International Journal of Thermophysics, 2008, 29 : 2062 - 2071
  • [4] Thermal Conductivity and Interfacial Thermal Resistance: Measurements of Thermally Oxidized SiO2 Films on a Silicon Wafer Using a Thermo-Reflectance Technique
    Kato, Ryozo
    Hatta, Ichiro
    INTERNATIONAL JOURNAL OF THERMOPHYSICS, 2008, 29 (06) : 2062 - 2071
  • [5] Influence of the metallic absorption layer on the quality of thermal conductivity measurements by the transient thermo-reflectance method
    Burzo, MG
    Komarov, PL
    Raad, PE
    MICROELECTRONICS JOURNAL, 2002, 33 (09) : 697 - 703
  • [6] Measurement of the thermal conductivity of TiO2 thin films by using the thermo-reflectance method
    Mun, Jungho
    Kim, Sok Won
    Kato, Ryozo
    Hatta, Ichiro
    Lee, Sang Hyun
    Kang, Kweon Ho
    THERMOCHIMICA ACTA, 2007, 455 (1-2) : 55 - 59
  • [7] MEASUREMENT OF IN-PLANE THERMAL CONDUCTIVITY USING SUSPENDED SiNx ISLANDS
    Alaie, Seyedhamidreza
    Goettler, Drew F.
    Abbas, Khawar
    El-Kady, Ihab
    Leseman, Zayd C.
    INTERNATIONAL MECHANICAL ENGINEERING CONGRESS AND EXPOSITION - 2012, VOL 9, PTS A AND B, 2013, : 611 - 615
  • [8] Transient thermo-reflectance measurements of the thermal conductivity and interface resistance of metallized natural and isotopically-pure silicon
    Komarov, PL
    Burzo, MG
    Kaytaz, G
    Raad, PE
    MICROELECTRONICS JOURNAL, 2003, 34 (12) : 1115 - 1118
  • [9] Measurement of interfacial thermal resistance by periodic heating and a thermo-reflectance technique
    Xu, Yibin
    Wang, Haitao
    Tanaka, Yoshihisa
    Shimono, Masato
    Yamazaki, Masayoshi
    MATERIALS TRANSACTIONS, 2007, 48 (02) : 148 - 150
  • [10] Thermal Conductivity Measurement of Thermally-Oxidized SiO2 Films on a Silicon Wafer Using a Thermo-Reflectance Technique
    R. Kato
    I. Hatta
    International Journal of Thermophysics, 2005, 26 : 179 - 190