Initial growth process of TiN films in ultrahigh-vacuum rapid thermal chemical vapor deposition

被引：0
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作者：
Okuda, Yasuyuki [1 ]
Naito, Shinya [1 ]
Nakatsuka, Osamu [2 ]
Kondo, Hiroki [1 ]
Okuhara, Tomoyuki [3 ]
Sakai, Akira [1 ]
Zaima, Shigeaki [1 ]
Yasuda, Yukio [4 ]
机构：
[1] Department of Crystalline Materials Science, Graduate School of Engineering, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
[2] Ecotopia Science Institute, Nagoya University, Furo-cho, Chikusa-ku, Nagoya 464-8603, Japan
[3] Toyoko Kagaku Co., Ltd., 1280 Nakamaruko, Nakahara-ku, Kawasaki 211-8502, Japan
[4] Research Institute of KUT, Kochi University of Technology, Tosayamada-cho, Kochi 782-8502, Japan
来源：
Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers | 2006年 / 45卷 / 1 A期
关键词：
RTCVD - Surface reaction - Ultrahigh-vacuum chemical vapor deposition;
D O I：
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学科分类号：
摘要：
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页码：49 / 53
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