Growth mechanism of anodic oxide film on Ti6Al4V alloy

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作者
Zheng, Guo-Qu [1 ]
Li, Wen-Jie [1 ]
Cao, Hua-Zhen [1 ]
机构
[1] College of Chemical Engineering and Materials Science, Zhejiang University of Technology, Hangzhou 310032, China
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关键词
Aluminum alloys - Film growth - Hydrofluoric acid - Titanium alloys - Titanium oxides - Nucleation - Ternary alloys - Porosity - Anodic oxidation;
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摘要
The growth mechanism of anodic oxide film on Ti6Al4V in HF and CrO3 solution was investigated. The surface morphology of the oxide film was observed by FESEM, and the V-t and i-t curves in different electrolytes were measured with an electrochemistry workstation. The results show that there exist two critical values of HF concentration to form a compact-porous structure under certain CrO3 concentration and applied current. A compact film is formed when the HF concentration is below the minimum critical value and a porous film is formed when the HF concentration is greater than the maximum critical value. The compact-porous structure can be obtained in solutions with HF concentration between the two critical values. It experiences a continuous nucleation process in the solution without HF and the film presents a nonporous structure. An instantaneous nucleation process is found in solutions with HF concentration ranged from 0.3% to 4.4% and the film is porous. The formation of titanium alloy anodic oxide film follows the mechanism of 3D nucleation.
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页码:101 / 104
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