Polarization change in ferroelectric thin film capacitors under external stress

被引：0
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作者：
Zhu, H. [1 ]
Chu, D.P. [1 ]
Fleck, N.A. [2 ]
Rowley, S.E. [3 ]
Saxena, S.S. [3 ]
机构：
[1] Electric Engineering Division, University of Cambridge, 9 JJ Thomson Avenue, Cambridge CB3 0FA, United Kingdom
[2] Department of Engineering, University of Cambridge, Cambridge CB2 1PZ, United Kingdom
[3] Cavendish Laboratory, University of Cambridge, Cambridge CB3 0HE, United Kingdom
来源：
Journal of Applied Physics | 2009年 / 105卷 / 06期
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