Fabrication of transparent conductive ZnO: Al films by direct current (DC) sputtering with a highly conductive ZnO ceramic target

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School of Physics and Technology, Wuhan University, Wuhan 430072, China [1 ]
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Wuhan Ligong Daxue Xuebao | 2007年 / 4卷 / 52-54期
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摘要：
Transparent conductive ZnO:Al films were deposited on glass sheet substrates by DC reactive magnetron sputtering, by using a highly conductive ZnO ceramic target. The effects of substrate temperature on structural, electrical and optical properties of the ZAO thin films were characterized by several techniques. The results showed that all the films were c-axis oriented, and the lowest electrical resistivity of the ZAO films, achieved at 300 °C, was 6. 33 × 10-4 Hem. The average transmission of ZAO films in the visible range was 80 %.
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