Study on vanadium films deposited on concave object by conventional direct current and high power pulsed magnetron sputtering

被引：0
|
作者：
Li, Chunwei [1 ,3 ]
Tian, Xiubo [1 ]
Liu, Tianwei [2 ]
Qin, Jianwei [2 ]
Yang, Jingjing [1 ]
Gong, Chunzhi [1 ]
Yang, Shiqin [1 ]
机构：
[1] State Key Laboratory of Advanced Welding and Joining, Harbin Institute of Technology, Harbin 150001, China
[2] State Key Laboratory of Surface Physics and Chemistry, China Academy of Engineering Physics, Mianyang 621900, China
[3] Northeast Forestry University, Harbin 150040, China
来源：
Xiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering | 2013年 / 42卷 / 12期
关键词：
Film thickness;
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页码：2437 / 2441
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