Diffusion at a planar interface using continuous distribution of sources

被引：0

作者：

Jagannadham, K. ^{[1
]}

机构：

[1] Materials Science and Engineering, North Carolina State University, Raleigh, NC 27695-7907, United States

来源：

Journal of Applied Physics | 2009年 / 105卷 / 02期

关键词：

Distribution functions - Substrates - Interfaces (materials);

D O I：

暂无

中图分类号：

学科分类号：

摘要：

Journal article (JA)

引用

共 50 条

[1] Diffusion at a planar interface using continuous distribution of sources
Jagannadham, K.
JOURNAL OF APPLIED PHYSICS, 2009, 105 (02)
[2] IMPROVED TRANSISTOR CHARACTERISTICS USING SOLID PLANAR DIFFUSION SOURCES FOR EMITTER DIFFUSION
WHEELER, R
RAPP, JE
SOLID STATE TECHNOLOGY, 1985, 28 (08) : 203 - 205
[3] EFFECTIVENESS OF PLANAR DIFFUSION SOURCES.
Robinson, Kenneth T.
Semiconductor International, 1987, 10 (07) : 88 - 91
[4] STUDIES OF DIFFUSION OF ANTIMONY FROM SOLID PLANAR DIFFUSION SOURCES
TREAT, CJ
TRESSLER, RE
RUZYLLO, J
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1988, 135 (03) : C131 - C131
[5] PRESENT STATUS OF ARSENIC PLANAR DIFFUSION SOURCES
TRESSLER, RE
BOEGLIN, HJ
MONKOWSKI, J
STACH, J
DEMUNDA, G
VOLK, C
SOLID STATE TECHNOLOGY, 1984, 27 (10) : 165 - 171
[6] DEPOSITION AND DIFFUSION OF SOLID SOURCES IN PLANAR PROCESSES
FUSAROLI, M
ELETTROTECNICA, 1970, 57 (08): : 490 - &
[7] FORMULATIONS OF VANDERMERE MISFIT DISLOCATION THEORY USING THE CONTINUOUS DISTRIBUTION OF INTERFACE DISLOCATIONS
NAKAHARA, S
THIN SOLID FILMS, 1981, 84 (02) : 214 - 214
[8] PHOSPHORUS DIFFUSION IN SILICON FROM ENCLOSED SOLID PLANAR SOURCES
FLEMISH, JR
TRESSLER, RE
RUZYLLO, J
JOURNAL OF THE ELECTROCHEMICAL SOCIETY, 1991, 138 (01) : 205 - 207
[9] ON DISCRIMINATION FACTOR FOR CONTINUOUS DISTRIBUTION OF NOISE SOURCES
ARASE, EM
JOURNAL OF THE ACOUSTICAL SOCIETY OF AMERICA, 1964, 36 (04): : 785 - &
[10] SHAPED PATTERNS FROM A CONTINUOUS PLANAR APERTURE DISTRIBUTION
ELLIOTT, RS
STERN, GJ
IEE PROCEEDINGS-H MICROWAVES ANTENNAS AND PROPAGATION, 1988, 135 (06) : 366 - 370

← 1 2 3 4 5 →