Hybrid low dielectric constant thin films for microelectronics

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[1] Volksen, W.
[2] Lionti, K.
[3] Magbitang, T.
[4] Dubois, G.
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Dubois, G. (gdubois@us.ibm.com) | 1600年 / Elsevier Ltd卷 / 74期
关键词：
Porous materials - Low-k dielectric - Microelectronics;
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