Matching parameter estimation for high power Inductively coupled plasma sources using Machine learning techniques

被引:0
|
作者
Tyagi, Himanshu [1 ,2 ]
Joshi, M. V. [2 ]
Bandyopadhyay, Mainak [1 ,3 ]
Singh, M. J. [1 ,3 ]
Pandya, Kaushal [4 ]
Chakraborty, Arun [1 ]
机构
[1] ITER India, Inst Plasma Res, Gandhinagar 382428, India
[2] DA IICT, DA IICT Rd, Gandhinagar 382007, Gujarat, India
[3] Homi Bhabha Natl Inst HBNI, Training Sch Complex, Mumbai 400094, India
[4] Inst Plasma Res, Gandhinagar 382428, India
关键词
Plasma diagnostics; Machine learning; Data driven model; Inductively coupled plasma; NEURAL-NETWORKS; ION SOURCE;
D O I
10.1016/j.fusengdes.2024.114675
中图分类号
TL [原子能技术]; O571 [原子核物理学];
学科分类号
0827 ; 082701 ;
摘要
Inductively coupled plasma or ICP sources form a basis for multiple applications ranging from semiconductor fabrication to reliable heating systems for tokamak machines. To meet the functional requirements, ICP sources need efficient plasma formation utilizing the various input parameters. Operation of ICP sources is a complex and challenging task since it involves scanning a wide multi-dimensional parameter space involving filament bias, radio frequency (RF) power, gas pressure, matching parameters, and other system configurations. The foremost challenge is to maximize the coupling of RF power in the ion source for efficient plasma formation. Standard ICP sources use a matching network that consists of variable capacitors to compensate for plasma inductance to enable maximum power coupling. Identification of an accurate set of matching parameters for high power sources is a complex task and is generally driven by operator experience which is established after years of operations. Due to these challenges, recent developments in the area of machine learning can be utilized for identifying the underlying model function to make accurate predictions and explore an alternative approach to the existing Physics-electrical models developed for the estimation of matching parameters for plasma sources. The present work attempts to perform a data-driven model discovery for the identification of appropriate matching parameters utilizing machine learning algorithms. In this work, ROBIN, a high-power ICP source that operates with a 1MHz, 100 kW RF generator is considered which has been operational since 2011 and has generated a considerable database. This database can be utilized for training/developing data-driven models for the estimation of matching parameters for ensuring better power coupling. The paper describes the development of two data-driven regression models for predicting the coupling efficiency in terms of power factor (denoted by Cos phi) and the capacitor values based on input parameters utilizing well known algorithms such as support vector machine, random forest and neural networks. Emphasis has been laid on developing the models using parameters that are tuneable externally. Also, the effect of system configurations on parameter prediction is investigated. The developed machine learning-based models have achieved test accuracy scores of 0.93 and 0.91 for predicting Cos phi and capacitor values respectively. The paper presents the training and optimization process for various machine and deep learning algorithms in detail.
引用
收藏
页数:10
相关论文
共 50 条
  • [1] HIGH-POWER INDUCTIVELY COUPLED PLASMA TORCH AND IMPEDANCE MATCHING NETWORK
    WINDSOR, DL
    HEINE, DR
    DENTON, MB
    APPLIED SPECTROSCOPY, 1979, 33 (01) : 56 - 58
  • [2] Application of Physics-Informed Machine Learning Techniques for Power Grid Parameter Estimation
    Lakshminarayana, Subhash
    Sthapit, Saurav
    Maple, Carsten
    SUSTAINABILITY, 2022, 14 (04)
  • [3] ANALYTIC MODEL OF POWER DEPOSITION IN INDUCTIVELY-COUPLED PLASMA SOURCES
    VAHEDI, V
    LIEBERMAN, MA
    DIPESO, G
    ROGNLIEN, TD
    HEWETT, D
    JOURNAL OF APPLIED PHYSICS, 1995, 78 (03) : 1446 - 1458
  • [4] Highly efficient RF-Impedance Matching Networks Inductively coupled Plasma Sources with high Efficiency for industrial Applications
    Beckmann, Rudolf
    Gesche, Roland
    Scherer, Joachim
    VAKUUM IN FORSCHUNG UND PRAXIS, 2014, 26 (01) : 28 - 33
  • [5] PROBABILISTIC RECORD MATCHING USING MACHINE LEARNING TECHNIQUES
    Ross, J. M.
    Cota, Fermin R. N.
    Zaric, G. S.
    VALUE IN HEALTH, 2016, 19 (03) : A82 - A83
  • [6] Plasma reactor etch modeling using inductively coupled plasma spectroscopy diagnostic techniques
    Mautz, KE
    PROCESS, EQUIPMENT, AND MATERIALS CONTROL IN INTEGRATED CIRCUIT MANUFACTURING III, 1997, 3213 : 230 - 240
  • [7] Rotational temperature of oxygen in a high-power inductively coupled plasma
    Michelt, B
    Lins, G
    Seeböck, RJ
    PROGRESS IN PLASMA PROCESSING OF MATERIALS 1997, 1997, : 193 - 200
  • [8] High-Power Inductively Coupled Impulse Sputtering Glow Plasma
    Yukimura, Ken
    Ogiso, Hisato
    Nakano, Shizuka
    Ehiasarian, Arutiun P.
    IEEE TRANSACTIONS ON PLASMA SCIENCE, 2011, 39 (11) : 3085 - 3094
  • [9] Wave propagation and power deposition in magnetically enhanced inductively coupled and helicon plasma sources
    Kinder, RL
    Kushner, MJ
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (01): : 76 - 86
  • [10] ESTIMATION OF POWER CONSUMPTION USING MACHINE LEARNING
    Divyadharshini, M.
    Pavithra, S.
    Priya, Shanmuga R.
    INTERNATIONAL JOURNAL OF EARLY CHILDHOOD SPECIAL EDUCATION, 2022, 14 (05) : 487 - 494