Tomographic projection optimization for volumetric additive manufacturing with general band constraint Lp-norm minimization

被引:0
|
作者
Li, Chi Chung [1 ]
Toombs, Joseph [1 ]
Taylor, Hayden K. [1 ]
Wallin, Thomas J. [2 ]
机构
[1] Univ Calif Berkeley, Dept Mech Engn, Etcheverry Hall 6124,2521 Hearst Ave, Berkeley, CA 94720 USA
[2] MIT, Dept Mat Sci & Engn, 6-113,77 Massachusetts Ave, Cambridge, MA 02139 USA
关键词
Volumetric additive manufacturing; Computed axial lithography; Tomographic reconstruction; Process planning; Optimization model;
D O I
10.1016/j.addma.2024.104447
中图分类号
T [工业技术];
学科分类号
08 ;
摘要
Tomographic volumetric additive manufacturing is a rapidly growing fabrication technology that enables rapid production of 3D objects through a single build step. In this process, the design of projections directly impacts geometric resolution, material properties, and manufacturing yield of the final printed part. Herein, we identify the hidden equivalent operations of three major existing projection optimization schemes and reformulate them into a general loss function where the optimization behavior can be systematically studied, and unique capabilities of the individual schemes can coalesce. The loss function formulation proposed in this study unified the optimization for binary and greyscale targets and generalized problem relaxation strategies with local tolerancing and weighting. Additionally, this formulation offers control on error sparsity and consistent dose response mapping throughout initialization, optimization, and evaluation. A parameter-sweep analysis in this study guides users in tuning optimization parameters for application-specific goals.
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页数:16
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