Characteristics of Multi-keV X-Ray Area Backlighting Sources Driven by Nanosecond Laser

被引：0

作者：

Xiong J. ^{[1
]}

An H. ^{[1
]}

Jia G. ^{[1
]}

Wang W. ^{[1
]}

Wang C. ^{[1
]}

Wang R. ^{[1
]}

Fang Z. ^{[1
]}

Dong J. ^{[1
]}

Lei A. ^{[1
]}

机构：

[1] Shanghai Institute of Laser Plasma, China Academy of Engineering Physics, Shanghai

来源：

| 1600年 / Science Press卷 / 44期

关键词：

Area backlighting sources; Chlorine; K-shell spectrum; Plasma; X-ray optics;

D O I：

10.3788/CJL201744.0901011

中图分类号：

学科分类号：

摘要：

Multi-keV X-rays are used as backlighting sources of the radiography to diagnose plasmas in high energy density physics (HEDP) experiments. We study the characteristics of Ti-4.7 keV and Cl-2.7 keV X-rays driven by nanosecond laser at the SG-II laser facility. The results show that the X-rays from Cl plasma are primarily He-like and H-like line radiation, with 2.7 keV He-α line on the strongest line emission. In addition, the relative intensity of Cl X-rays is more than an order of magnitude compared to that of Ti X-rays under the current SG-II laser conditions. Therefore, the Cl X-rays can be used as the backlighting diagnosis. © 2017, Chinese Lasers Press. All right reserved.

引用

共 19 条

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