CoSi2 formation in the Ti/Co/SiO2/Si system

被引:0
|
作者
机构
来源
| 1600年 / American Institute of Physics Inc.卷 / 88期
关键词
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] CoSi2 formation in the Ti/Co/SiO2/Si system
    Detavernier, C
    Van Meirhaeghe, RL
    Cardon, F
    Maex, K
    Bender, H
    Zhu, SY
    JOURNAL OF APPLIED PHYSICS, 2000, 88 (01) : 133 - 140
  • [2] CoSi2 formation through SiO2
    Detavernier, C
    Van Meirhaeghe, RL
    Cardon, F
    Maex, K
    THIN SOLID FILMS, 2001, 386 (01) : 19 - 26
  • [3] CoSi2/TiO2/SiO2/Si gate structure formation
    Rogozhin, A. E.
    Khorin, I. A.
    Naumov, V. V.
    Orlikovsky, A. A.
    Ovcharov, V. V.
    Rudakov, V., I
    Vasiliev, A. G.
    INTERNATIONAL CONFERENCE ON MICRO- AND NANOELECTRONICS 2009, 2010, 7521
  • [4] Formation of the TiN/CoSi2 system by rapid thermal annealing of a Co/Ti/Si structure
    Rudakov V.I.
    Gusev V.N.
    Russ. Microelectr., 2008, 4 (215-225): : 215 - 225
  • [5] MECHANISMS OF EPITAXIAL COSI2 FORMATION IN THE MULTILAYER CO/TI-SI(100) SYSTEM
    HONG, F
    ROZGONYI, GA
    PATNAIK, BK
    APPLIED PHYSICS LETTERS, 1994, 64 (17) : 2241 - 2243
  • [6] ON THE FORMATION OF EPITAXIAL COSI2 FROM THE REACTION OF SI WITH A CO/TI BILAYER
    ZHANG, SL
    CARDENAS, J
    DHEURLE, FM
    SVENSSON, BG
    PETERSSON, CS
    APPLIED PHYSICS LETTERS, 1995, 66 (01) : 58 - 60
  • [7] COSI2 FORMATION ON SI(100) USING AN AMORPHOUS CO-TI ALLOY
    DUCHATEAU, JPWB
    CROMBEEN, JE
    LATHOUWERS, EGC
    READER, AH
    SEMICONDUCTOR SCIENCE AND TECHNOLOGY, 1992, 7 (11) : 1310 - 1315
  • [8] Control of Co flux through ternary compound for the formation of epitaxial CoSi2 using Co/Ti/Si system
    Kim, GB
    Baik, HK
    Lee, SM
    APPLIED PHYSICS LETTERS, 1996, 69 (23) : 3498 - 3500
  • [9] GROWTH OF COSI2 AND COSI2/SI SUPERLATTICES
    HENZ, J
    OSPELT, M
    VONKANEL, H
    HETEROSTRUCTURES ON SILICON : ONE STEP FURTHER WITH SILICON, 1989, 160 : 215 - 222
  • [10] Thin CoSi2 formation on SiO2 with low-energy ion irradiation
    Matsushita, Atsushi
    Sadoh, Taizoh
    Tsurushima, Toshio
    Japanese Journal of Applied Physics, Part 1: Regular Papers & Short Notes & Review Papers, 1998, 37 (11): : 6117 - 6122