Characterization of amorphous CHON films grown by inductively coupled plasma chemical vapor deposition

被引：0
|
作者：
机构：
[1] [1,2,Chen, Fei
[2] 1,2,Wu, Weidong
[3] 1,2,Gan, Taiyuan
[4] 1,Cao, Linhong
来源：
Wu, W. (wuweidongding@163.com) | 1600年 / Science Press, 18,Shuangqing Street,Haidian, Beijing, 100085, China卷 / 33期
关键词：
Compendex;
D O I：
10.3969/j.issn.1672-7126.2013.05.03
中图分类号：
学科分类号：
摘要：
Deposition rates
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