Fabrication techniques by using laser direct writing system

被引：0
|
作者：
Li, Feng-You [1 ]
Lu, Zhen-Wu [1 ]
Zhang, Dian-Wen [1 ]
Li, Hong-Jun [1 ]
Zhao, Jing-Li [1 ]
Cong, Xiao-Jie [1 ]
Weng, Zhi-Cheng [1 ]
机构：
[1] Inst. of Optics and Fine Mech., Chinese Acad. of Sci., Changchun 130022, China
来源：
Guangdianzi Jiguang/Journal of Optoelectronics Laser | 2001年 / 12卷 / 09期
关键词：
Laser applications;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
A new laser direct writing system is introduced and fabrication techniques with laser direct writing are developed. The intensity distribution and size of the writing spot within photoresist are discussed in different defocusing cases. The reticle with feature linewidth of 10 μm and the grating with period of 20 μm are fabricated by using the laser direct writing system under intentional defocusing.
引用
收藏
页码：949 / 952
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