Low-loss and low-temperature Al2O3 thin films for integrated photonics and optical coatings

Amorphous aluminum oxide (Al2O3) is a key material in optical coatings due to its notable properties, including a broad transparency window (ultraviolet to mid-infrared) and excellent durability. Moreover, its higher refractive index contrast relative to silica cladding layers and high solubility of rare-earth ions make it well suited for optical waveguides and the development of various functionalities in integrated photonics. In many coatings and integrated photonics applications, the substrates are temperature and stress sensitive, while relatively thick (similar to 1 mu m) alumina layers are required; thus, it is crucial to fabricate low optical loss alumina thin films at low deposition temperatures, while maintaining high deposition rates. In this study, plasma-assisted reactive magnetron sputtering, operated in an alternating current mode, is investigated as a reliable, straightforward, and wafer-scale compatible technique for the deposition of high optical quality and uniform Al2O3 thin films at low temperature. One-micrometer-thick amorphous Al2O3 planar waveguides, deposited at 150 degrees C and a rate of 23.3 nm/min, exhibit optical losses below 1 dB/cm at 638 nm and as low as 0.1 dB/cm in the conventional optical communication band.