Effect of substrate DC bias voltage and anode voltage on the properties of Cu films using magnetron sputtering with multipolar magnetic plasma confinement assisted by inductively coupled plasma

被引：0
|
作者：
Department of Electronics and Photonic Systems, Hiroshima Institute of Technology, 2-1-1, Miyake, Saeki-ku, Hiroshima 731-5193, Japan [1 ]
机构：
来源：
Journal of the Vacuum Society of Japan | 2008年 / 51卷 / 06期
关键词：
D O I：
10.3131/jvsj2.51.408
中图分类号：
学科分类号：
摘要：
引用
收藏
页码：408 / 411
相关论文
共 50 条
  • [1] Effects of magnetic flux density and substrate bias voltage on Ni films prepared on a flexible substrate material using unbalanced magnetron sputtering assisted by inductively coupled plasma
    Koda, Tatsunori
    Toyota, Hiroshi
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2014, 32 (02):
  • [2] Effect of Substrate Bias Voltage on the Properties of Hafnium Nitride Films Deposited by Radio Frequency Magnetron Sputtering Assisted by Inductive Coupled Nitrogen Plasma
    Heo, Sung Bo
    Lee, Hak Min
    Kim, Daeil
    Choi, Dae Han
    Lee, Byung Hoon
    Kim, Min Gyu
    Lee, Jin Hee
    TRANSACTIONS ON ELECTRICAL AND ELECTRONIC MATERIALS, 2011, 12 (05) : 209 - 212
  • [3] High rate sputtering for Ni films by an rf-dc coupled magnetron sputtering system with multipolar magnetic plasma confinement
    Kawabata, K
    Tanaka, T
    Kitabatake, A
    Yamada, K
    Mikami, Y
    Kajioka, H
    Toiyama, K
    JOURNAL OF VACUUM SCIENCE & TECHNOLOGY A, 2001, 19 (04): : 1438 - 1441
  • [4] RF power dependence on structural and electrical properties of CU thin films on a glass substrate prepared using magnetron sputtering with multipolar magnetic plasma confinement
    Katayama T.
    Toyota H.
    IEEJ Transactions on Sensors and Micromachines, 2020, 140 (08) : 188 - 192
  • [5] Plasma properties and ion energy distribution in DC magnetron sputtering assisted by inductively coupled RF plasma
    Li, ZG
    Miyake, S
    Mori, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 2003, 42 (11): : 7086 - 7090
  • [6] Plasma Properties and Ion Energy Distribution in DC Magnetron Sputtering Assisted by Inductively Coupled RF Plasma
    Li, Z. (zhglee@jwri.osaka-u.ac.jp), 1600, Japan Society of Applied Physics (42):
  • [7] Plasma Uniformity Analysis of Inductively Coupled Plasma Assisted Magnetron Sputtering by a 2D Voltage Probe Array
    Joo, Junghoon
    APPLIED SCIENCE AND CONVERGENCE TECHNOLOGY, 2014, 23 (04): : 161 - 168
  • [8] The effect of substrate bias voltage on PbTe films deposited by magnetron sputtering
    Ren, Wei
    Cao, Wentian
    Wang, Shuyun
    Sui, Mingxiao
    Lu, Huifen
    JOURNAL OF ALLOYS AND COMPOUNDS, 2011, 509 (20) : 5947 - 5951
  • [9] Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering
    Dzhumaliev, A. S.
    Nikulin, Yu. V.
    Filimonov, Yu. A.
    PHYSICS OF THE SOLID STATE, 2016, 58 (06) : 1247 - 1256
  • [10] Effect of bias voltage polarity of a substrate on the texture, microstructure, and magnetic properties of Ni films prepared by magnetron sputtering
    A. S. Dzhumaliev
    Yu. V. Nikulin
    Yu. A. Filimonov
    Physics of the Solid State, 2016, 58 : 1247 - 1256
12345