Strong anisotropy in thin magnetic films deposited on obliquely sputtered Ta underlayers

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作者：
McMichael, R.D.
Lee, C.G.
Bonevich, J.E.
Chen, P.J.
Miller, W.
Egelhoff, Jr., W.F.
机构：
[1] Natl. Inst. of Std. and Technology, Gaithersburg, MD 20899, United States
[2] Dept. of Metall. and Mat. Science, Changwon National University, Changwon, Kyungnam 641-773, Korea, Republic of
来源：
| 1600年 / American Institute of Physics Inc.卷 / 88期
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