Optimized analysis of random point array illumination source for nanometer accuracy wavefront error testing

被引：0
|
作者：
Lu, Zengxiong [1 ,2 ]
Qi, Yuejing [1 ,2 ]
Qi, Wei [1 ,2 ]
Su, Jiani [1 ,2 ]
Peng, Zhuojun [1 ,2 ]
机构：
[1] Academy of Opto-Electronics, Chinese Academy of Sciences, Beijing,100094, China
[2] Beijing Excimer Laser Technology and Engineering Center, Beijing,100094, China
来源：
Guangxue Xuebao/Acta Optica Sinica | 2015年 / 35卷 / 06期
关键词：
20;
D O I：
10.3788/AOS201535.0612007
中图分类号：
学科分类号：
摘要：
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