Infrared spectroscopic and modeling studies of H2/CH4 microwave plasma gas phase from low to high pressure and power

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[1] Rond, C.
[2] Hamann, S.
[3] Wartel, M.
[4] Lombardi, G.
[5] Gicquel, A.
[6] Röpcke, J.
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| 1600年 / American Institute of Physics Inc.卷 / 116期
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InfraRed Tunable Diode Laser Absorption Spectroscopy technique has been implemented in a H2/CH4 Micro-Wave (MW frequency f = 2.45 GHz) plasma reactor dedicated to diamond deposition under high pressure and high power conditions. Parametric studies such as a function of MW power; pressure; and admixtures of methane have been carried out on a wide range of experimental conditions: the pressure up to 270 mbar and the MW power up to 4 kW. These conditions allow high purity Chemical Vapor Deposition diamond deposition at high growth rates. Line integrated absorption measurements have been performed in order to monitor hydrocarbon species; i.e; CH3; CH4; C2H2; C2H4; and C2H6. The densities of the stable detected species were found to vary in the range of 1012-1017 molecules cm-3; while the methyl radical CH3 (precursor of diamond growth under these conditions) measured into the plasma bulk was found up to 1014 molecules cm-3. The experimental densities have been compared to those provided by 1D-radial thermochemical model for low power and low pressure conditions (up to 100 mbar/2 kW). These densities have been axially integrated. Experimental measurements under high pressure and power conditions confirm a strong increase of the degree of dissociation of the precursor; associated to an increase of the C2H2 density; the most abundant reaction product in the plasma. © 2014 AIP Publishing LLC;
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