Overlay Measurement Systems

被引：0
|
作者：
Hosoi, Keiichi [1 ]
机构：
[1] Nikon Instrument Co., Semiconductor Metrology Department, Yokohama, Japan
来源：
Advanced Imaging | 2002年 / 17卷 / 11期
关键词：
Cameras - Charge coupled devices - Dynamic random access storage - Image processing - Optical microscopy;
D O I：
暂无
中图分类号：
学科分类号：
摘要：
The significance of Nikon NRM-3000/1000 series overlay measurement system is discussed. The system features state-of-the-art measurement and inspection technologies. NRM combines optical microscopes with exclusive optical systems, a CCD camera and an image processing computer. One of the major task of the NRM is to check the correct construction of building.
引用
收藏
页码：22 / 26
相关论文
共 50 条
  • [1] Study simulation and measurement evaluation of spread spectrum overlay in analog broadcasting systems
    Dres, D
    Vouyioukas, D
    Constantinou, P
    IEEE 56TH VEHICULAR TECHNOLOGY CONFERENCE, VTC FALL 2002, VOLS 1-4, PROCEEDINGS, 2002, : 2022 - 2025
  • [2] The FastTrack overlay: A measurement study
    Liang, J
    Kumar, R
    Ross, KW
    COMPUTER NETWORKS, 2006, 50 (06) : 842 - 858
  • [3] Dependence of offset error on overlay mark structures in overlay measurement
    Kawai, Akira
    Watanabe, Jinzou
    Nagata, Hitoshi
    Takata, Masasuke
    Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers, 1992, 31 (2 A): : 385 - 390
  • [4] Overlay measurement based on dual-overlay grating image
    Shyu, Deh-Ming
    Ku, Yi-sha
    Dong, Shu-Ping
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXII, PTS 1 AND 2, 2008, 6922 (1-2):
  • [5] DEPENDENCE OF OFFSET ERROR ON OVERLAY MARK STRUCTURES IN OVERLAY MEASUREMENT
    KAWAI, A
    WATANABE, J
    NAGATA, H
    TAKATA, M
    JAPANESE JOURNAL OF APPLIED PHYSICS PART 1-REGULAR PAPERS SHORT NOTES & REVIEW PAPERS, 1992, 31 (2A): : 385 - 390
  • [6] Overlay measurement: Hidden error
    Gould, CJ
    Goodwin, F
    Roberts, W
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XIV, 2000, 3998 : 400 - 415
  • [7] Size matters in overlay measurement
    Smith, Nigel P.
    Peterson, Brennan L.
    Goelzer, Gary R.
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXVI, PTS 1 AND 2, 2012, 8324
  • [8] Investigation on Accuracy of Process Overlay Measurement
    Hwang, Chan
    Lee, Jeongjin
    Lee, Seungyoon
    Yeo, Jeongho
    Kim, Yeonghee
    Lim, Hongmeng
    Choi, Dongsub
    METROLOGY, INSPECTION, AND PROCESS CONTROL FOR MICROLITHOGRAPHY XXV, PT 1 AND PT 2, 2011, 7971
  • [9] On the schedulability of measurement conflict in overlay networks
    Fraiwan, Mohammad
    Manimaran, G.
    NETWORKING 2007: AD HOC AND SENSOR NETWORKS, WIRELESS NETWORKS, NEXT GENERATION INTERNET, PROCEEDINGS, 2007, 4479 : 1120 - +
  • [10] A novel method for overlay measurement by Scatterometry
    Hsu, Wei-Te
    Ku, Yi-Sha
    Shyu, Deh-Ming
    OPTICAL INSPECTION AND METROLOGY FOR NON-OPTICS INDUSTRIES, 2009, 7432
12345