Fabrication of Mask by Drag Coating Convective Self-Assembly in Nanosphere Lithography for Nanohole Array

被引：0

作者：

Onodera T. ^{[1
]}

Mieda K. ^{[1
]}

Taniguchi K. ^{[1
]}

机构：

[1] Graduate School, Faculty of Information Science and Electrical Engineering, Kyushu University, 744, Motooka, Nishi-ku, Fukuoka

来源：

IEEJ Transactions on Sensors and Micromachines | 2022年 / 142卷 / 01期

基金：

日本学术振兴会;

关键词：

colloidal crystal; convective self-assembly; nanohole array; nanosphere lithography;

D O I：

10.1541/ieejsmas.142.15

中图分类号：

学科分类号：

摘要：

To fabricate a nanohole array chip, a mask in nanosphere lithography was fabricated by drag-coating convective self-assembly using two glass slides. The relationship between the volume fraction of 500-nm-diameter polystyrene (PS) particles and the deposition rate under our experimental conditions was determined. Masks with a monolayer of PS particles were deposited on glass slides. Plasma etching of the PS particles was carried out to reduce their diameter. Au was sputtered over the mask, and the mask was then removed. Finally, a nanohole array was obtained using this simple procedure. © 2022 The Institute of Electrical Engineers of Japan.

引用

页码：15 / 16

页数：1

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