NH3 dissociative adsorption on Si(100)-(2×1) surface: A B3LYP quantum chemical cluster model study
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Xu, X.
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Institute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, JapanInstitute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, Japan
Xu, X.
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Kang, S.-Y.
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Institute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, JapanInstitute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, Japan
Kang, S.-Y.
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Yamabe, T.
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Institute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, JapanInstitute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, Japan
Yamabe, T.
[1
]
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[1] Institute for Fundamental Chemistry, 34-4 Takano-Nishihiraki-cho, Kyoto 606-8103, Japan
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Department of Molecular Engineering, Kyoto University, Kyoto 606-8501, JapanDepartment of Molecular Engineering, Kyoto University, Kyoto 606-8501, Japan
Xu, Xin
Kang, S.-Y.
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Department of Molecular Engineering, Kyoto University, Kyoto 606-8501, JapanDepartment of Molecular Engineering, Kyoto University, Kyoto 606-8501, Japan
Kang, S.-Y.
Yamabe, T.
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Department of Molecular Engineering, Kyoto University, Kyoto 606-8501, JapanDepartment of Molecular Engineering, Kyoto University, Kyoto 606-8501, Japan