Effect of nitrogen flow rate on structure and properties of MoNxcoatings deposited by facing target sputtering

被引:0
|
作者
机构
[1] Wang, Tao
[2] Zhang, Guojun
[3] Ren, Shuai
[4] Jiang, Bailing
来源
Wang, Tao | 1600年 / Elsevier Ltd卷 / 701期
关键词
Reactive sputtering - Nitrogen - Tribology - High resolution transmission electron microscopy - Coatings - Crystal structure - Nitrides - X ray diffraction - Molybdenum compounds - Phase structure - Scanning electron microscopy;
D O I
暂无
中图分类号
学科分类号
摘要
引用
收藏
相关论文
共 50 条
  • [1] Effect of nitrogen flow rate on structure and properties of MoNx coatings deposited by facing target sputtering
    Wang, Tao
    Zhang, Guojun
    Ren, Shuai
    Jiang, Bailing
    JOURNAL OF ALLOYS AND COMPOUNDS, 2017, 701 : 1 - 8
  • [2] Structure and electrical properties of ITO thin films deposited at high rate by facing target sputtering
    Hoshi, Y
    Kato, H
    Funatsu, K
    THIN SOLID FILMS, 2003, 445 (02) : 245 - 250
  • [3] Effect of oxygen flow rate on ITO thin films deposited by facing targets sputtering
    Kim, Youn J.
    Jin, Su B.
    Kim, Sung I.
    Choi, Yoon S.
    Choi, In S.
    Han, Jeon G.
    THIN SOLID FILMS, 2010, 518 (22) : 6241 - 6244
  • [4] ITO films deposited by facing target sputtering
    Osamu Kamiya
    Yusuke Onai
    Hiro-omi Kato
    Yoichi Hoshi
    Journal of Materials Science: Materials in Electronics, 2007, 18 : 359 - 362
  • [5] ITO films deposited by facing target sputtering
    Kamiya, Osamu
    Onai, Yusuke
    Kato, Hiro-omi
    Hoshi, Yoichi
    JOURNAL OF MATERIALS SCIENCE-MATERIALS IN ELECTRONICS, 2007, 18 (Suppl 1) : S359 - S362
  • [6] Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method
    Kim, Hong Tak
    Park, Jun Young
    Park, Chinho
    KOREAN JOURNAL OF CHEMICAL ENGINEERING, 2012, 29 (05) : 676 - 679
  • [7] Effects of nitrogen flow rate on titanium nitride films deposition by DC facing target sputtering method
    Hong Tak Kim
    Jun Young Park
    Chinho Park
    Korean Journal of Chemical Engineering, 2012, 29 : 676 - 679
  • [8] Structure and magnetic properties of Fe-Ti-N films deposited by DC magnetron facing target sputtering
    Peng, DL
    Sumiyama, K
    Oku, M
    Li, DX
    Suzuki, K
    PHYSICA STATUS SOLIDI A-APPLIED RESEARCH, 1996, 157 (01): : 139 - 152
  • [9] Structure and magnetic properties of Fe-Ti-N films deposited by DC magnetron facing target sputtering
    Tohoku Univ, Sendai, Japan
    Phys Status Solidi A, 1 (139-152):
  • [10] Effect of RF power on the properties of intrinsic hydrogenated amorphous silicon passivation layer deposited by facing target sputtering
    Shiratori, Yuta
    Zulkifly, Faris Akira Bin Mohd
    Nakada, Kazuyoshi
    Miyajima, Shinsuke
    APPLIED PHYSICS EXPRESS, 2018, 11 (03)